BSM Series Short-Wave Infrared Modular Microscopy System

Product Introduction

The BSM Series Short-Wave Infrared (SWIR) modular microscopy system represents a next-generation SWIR microscopy imaging technology platform, extending the imaging range from traditional visible spectrum (400-700 nm) to the 900-1700 nm band. The system employs high-sensitivity InGaAs sensor technology combined with the professional M Plan Apo NIR objective series, breaking through the optical barrier of silicon-based materials to achieve penetrative non-destructive inspection. Through modular architecture design integrating advanced illumination modules, imaging modules, and precision mechanical modules, it provides micrometer-resolution subsurface defect detection capabilities for semiconductor manufacturing, materials science, and industrial inspection fields. The system utilizes standard glass lenses, avoiding expensive reflective optical elements and significantly reducing the technical barrier and application cost of SWIR imaging.

Product Features

  • Full coverage of 900-1700 nm SWIR imaging band
  • Silicon material penetrative imaging technology for non-destructive internal inspection
  • Three tube lens systems available (BSM-T180VA/T090VA/T100VA)
  • Maximum 33 mm image field design, compatible with large-format sensors
  • M Plan Apo NIR professional objective series (5X-50X HR)
  • 0.4 µm ultra-high optical resolution (50X HR objective)
  • Coaxial epi-illumination Köhler illumination system
  • Integrated 1200/1300/1400/1550 nm multi-wavelength LED light sources
  • Compatible with high-performance InGaAs sensor cameras (0.33M-5.0M)
  • Real-time imaging capability with frame rates up to 400 fps@640×512
  • TEC cooling technology ensuring low-noise, high SNR imaging
  • Standard C-mount design compatible with various camera systems
  • Modular architecture supporting flexible customization and upgrades
  • Precision CNC machining with anti-vibration design
  • Standard glass optical system for cost-effectiveness optimization

System Configuration and Parameters

SWIR microscopy imaging technology breaking traditional optical limitations, providing revolutionary solutions for semiconductor and material inspection

System Technical Principles

The BSM Series utilizes the unique physical properties of short-wave infrared light to achieve penetrative imaging of silicon-based materials and other semiconductor materials. Through precise optical design and high-sensitivity sensors, the system visualizes internal structures that cannot be observed with traditional microscopes.

Silicon Penetrative Imaging Technology

SWIR photon energy is below the silicon bandgap (1.1 eV), enabling penetration through silicon-based materials for non-destructive detection of internal defects including micro-cracks and welding failures

Optical System Compatibility

Employs standard glass lens system, avoiding expensive reflective optical elements required for mid-wave and long-wave infrared imaging, reducing manufacturing costs and simplifying system integration

Modular Architecture Design

Independent design of illumination, imaging, and mechanical modules, supporting customized upgrades based on specific wavelength, sensor, or automation requirements

Enhanced Material Contrast

SWIR wavelengths improve visibility of features obscured in visible light, enabling clear imaging of internal structures in composite materials

Tube Lens System Configuration

Standard Configuration - Universal Inspection Platform
Model: BSM-T180VA / BSM-T090VA
Tube Lens Focal Length
180 mm / 90 mm
Image Field Size
24 mm (180 mm tube lens)
Spectral Range
900-1700 nm
Illumination Method
Coaxial epi-illumination Köhler
LED Light Sources
1200/1300/1400/1550 nm
High-End Configuration - Ultimate Performance Platform
Model: BSM-T100VA
Tube Lens Focal Length
100 mm
Image Field Size
33 mm (200 mm tube lens)
Spectral Range
900-1700 nm
Illumination Method
Coaxial epi-illumination Köhler
LED Light Sources
1200/1300/1400/1550 nm

M Plan Apo NIR Objective Series

High-performance microscopy objectives specifically optimized for SWIR band, providing exceptional imaging quality and penetration capability

Model Magnification NA WD Focal Length Resolution Depth of Field FN Weight
M Plan Apo NIR 5X 5X 0.14 37.5 mm 40 mm 2.0 µm 14 µm 24 mm 220 g
M Plan Apo NIR 10X 10X 0.26 30.5 mm 20 mm 1.1 µm 4.1 µm 24 mm 250 g
M Plan Apo NIR 20X 20X 0.4 20 mm 10 mm 0.7 µm 1.7 µm 24 mm 300 g
M Plan Apo NIR 50X 50X 0.42 17 mm 4 mm 0.7 µm 1.6 µm 24 mm 315 g
M Plan Apo NIR 50X HR
High-resolution version
50X 0.65 10 mm 4 mm 0.4 µm 0.7 µm 24 mm 450 g

SWIR Series Camera Configuration

High-performance InGaAs sensor cameras equipped with TEC cooling, providing excellent signal-to-noise ratio and imaging quality

SWIR5000KMA
Sensor
5.0M IMX992 (M,GS)
Sensor Size
1/1.4'' (8.94×7.09 mm)
Pixel Size
3.45×3.45 µm
SNR
High Gain: 51.5 dB
Low Gain: 48.5 dB
Frame Rate
61.9@2560×2048
135.7@1280×1024
Exposure Time
15 µs~60 s
Cooling
Built-in TEC
SWIR3000KMA
Sensor
3.0M IMX993 (M,GS)
Sensor Size
1/1.8'' (7.07×5.3 mm)
Pixel Size
3.45×3.45 µm
SNR
High Gain: 51.5 dB
Low Gain: 48.5 dB
Frame Rate
93@2048×1536
176@1024×768
Exposure Time
15 µs~60 s
Cooling
Built-in TEC
SWIR1300KMA
Sensor
1.3M IMX990 (M,GS)
Sensor Size
1/2'' (6.40×5.12 mm)
Pixel Size
5×5 µm
SNR
High Gain: 58.7 dB
Low Gain: 52.6 dB
Frame Rate
200@1280×1024
392@640×512
Exposure Time
15 µs~60 s
Cooling
Built-in TEC
SWIR330KMA
Sensor
0.33M IMX991 (M,GS)
Sensor Size
1/4'' (3.20×2.56 mm)
Pixel Size
5×5 µm
SNR
High Gain: 58.7 dB
Low Gain: 52.6 dB
Frame Rate
400@640×512
753@320×256
Exposure Time
15 µs~60 s
Cooling
Built-in TEC

Typical Application Cases

Professional applications of BSM system in semiconductor manufacturing, materials science, and other fields

Semiconductor Manufacturing and Inspection

The BSM Series enables non-destructive inspection of internal defects in silicon wafers and chips during semiconductor manufacturing processes. The system can penetrate silicon-based materials to clearly reveal subsurface defects, micro-cracks, and interconnect structures, providing critical technical support for chip quality control and failure analysis.

Application Case

Equipment: BSM-T090VA System Objective: 10X Infinity-Corrected SWIR Microscopy Objective Camera: SWIR5000KMA Sample: Silicon-based chip Result: Successfully detected and located internal hidden cracks in chip
  • Non-destructive inspection of internal defects in silicon wafers
  • Chip interconnect structure integrity assessment
  • Precise localization of subsurface micro-cracks
  • Real-time monitoring of welding quality
  • Package integrity verification

Ceramic Material Defect Detection

The system plays a crucial role in ceramic and composite material inspection, capable of identifying subsurface cracks, porosity, and inclusions. SWIR imaging technology reveals internal structural defects that cannot be observed with traditional optical methods, providing reliable basis for material quality assessment.

Application Case

Equipment: BSM-T090VA System Objective: 10X Infinity-Corrected SWIR Microscopy Objective Camera: SWIR5000KMA Sample: Ceramic material Result: Clearly displayed distribution of internal hidden cracks in ceramics
  • Visualization of internal cracks in ceramics
  • Delamination detection in composite materials
  • Porosity distribution analysis
  • Inclusion identification and localization
  • Structural integrity assessment

More Application Fields

Industrial Non-Destructive Testing

The BSM Series provides high-precision non-destructive testing capabilities for industrial components. The system can analyze internal structures, detect assembly defects, and evaluate material uniformity, completing comprehensive quality assessment without destructive disassembly.

  • Component internal structure analysis
  • Assembly quality verification
  • Material uniformity assessment

Materials Science Research

The system is used in materials science research to analyze the microstructure, phase distribution, and defect characteristics of new materials. SWIR imaging provides unique material contrast, helping understand the relationship between material properties and microstructure.

  • New material structure characterization
  • Phase distribution visualization
  • Grain boundary observation and analysis

Technical Advantage Comparison

Comparison Technology BSM System Advantages
Traditional Optical Microscopy BSM system can penetrate silicon-based and other opaque materials to observe internal structures, while traditional microscopes can only observe surfaces
X-ray Inspection BSM system has no radiation hazards, higher resolution, enables real-time imaging, with lower equipment and maintenance costs
Ultrasonic Testing BSM system provides higher spatial resolution and image clarity, capable of identifying micrometer-level defects
Mid-wave/Long-wave Infrared Systems BSM system uses standard glass optical elements with lower cost and better compatibility with existing microscope platforms

System Configuration and Accessories

Standard Configuration
  • BSM main system (BSM-T180VA/T090VA/T100VA selectable)
  • Multi-wavelength LED light source module
  • Coaxial epi-illumination system
  • C-mount camera adapter
  • Precision focusing mechanism
Optional Accessories
  • M Plan Apo NIR objective series (5X-50X HR)
  • SWIR camera series (330K-5000K resolution)
  • Automated sample stage
  • Image acquisition and analysis software
  • Anti-vibration platform
  • Custom wavelength LED sources

The BSM Series features modular architecture design, supporting customized upgrades based on specific wavelength, sensor, or automation requirements

BSM System Advantages

Revolutionary SWIR microscopy imaging technology, opening a new era of material internal inspection

Silicon Penetration Imaging Capability

SWIR photon energy is below the silicon band gap, enabling non-destructive detection of internal defects in silicon-based materials, including micro-cracks, solder failures, and other subsurface defects.

Wide-Band Imaging Coverage

900-1700 nm wide-band imaging capability with multi-wavelength LED light sources, meeting imaging requirements for different materials and applications.

Modular Architecture Design

Independent design of illumination, imaging, and mechanical modules, supporting customized upgrades based on specific requirements, ensuring system flexibility and expandability.

Cost-Effective Solution

Uses standard glass optical elements, avoiding expensive reflective optical systems, reducing equipment costs and maintenance fees.

Real-Time Imaging Capability

High-speed InGaAs sensors support real-time imaging with frame rates up to 400 fps, meeting online inspection and dynamic observation requirements.

Micron-Level Resolution

Professional M Plan Apo NIR objective series achieves resolution up to 0.4 µm, precisely identifying minute defects and structural details.